Original language | English |
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Pages (from-to) | 703-727 |
Number of pages | 25 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 3873 (I |
DOIs | |
State | Published - 1999 |
Externally published | Yes |
Event | 19th Annual BACUS Symposium on Photomask Technology - Monterey, CA, USA Duration: Sep 15 1999 → Sep 17 1999 |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering