| Idioma original | English |
|---|---|
| Páginas (desde-hasta) | I/- |
| Publicación | Proceedings of SPIE - The International Society for Optical Engineering |
| Volumen | 3873 |
| Estado | Published - 1999 |
| Evento | 19th Annual BACUS Symposium on Photomask Technology - Monterey, CA, USA Duración: sept 15 1999 → sept 17 1999 |
ASJC Scopus Subject Areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering