MoSi PSM defect inspection and sensitivity analysis

Producción científica: Conference article › revisión exhaustiva

Idioma original	English
Páginas (desde-hasta)	121-131
Número de páginas	11
Publicación	Proceedings of SPIE - The International Society for Optical Engineering
Volumen	3546
DOI	https://doi.org/10.1117/12.332816
Estado	Published - 1998
Publicado de forma externa	Sí
Evento	Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management - Redwood City, CA, USA Duración: sept 16 1998 → sept 18 1998

ASJC Scopus Subject Areas

@article{051cc4e4af814ddfb5eab944fe590af6,

title = "MoSi PSM defect inspection and sensitivity analysis",

author = "Chen, \{Jerry X.\} and Henderson, \{Robert K.\} and Franklin Kalk",

year = "1998",

doi = "10.1117/12.332816",

language = "English",

volume = "3546",

pages = "121--131",

note = "Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management ; Conference date: 16-09-1998 Through 18-09-1998",

}

TY - JOUR

T1 - MoSi PSM defect inspection and sensitivity analysis

AU - Chen, Jerry X.

AU - Henderson, Robert K.

AU - Kalk, Franklin

PY - 1998

Y1 - 1998

UR - https://www.scopus.com/pages/publications/0032289177

UR - https://www.scopus.com/pages/publications/0032289177#tab=citedBy

U2 - 10.1117/12.332816

DO - 10.1117/12.332816

M3 - Conference article

AN - SCOPUS:0032289177

SN - 0277-786X

VL - 3546

SP - 121

EP - 131

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Proceedings of the 1998 18th Annual Symposium on Photomask Technology and Management

Y2 - 16 September 1998 through 18 September 1998

ER -